The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1999
Filed:
Nov. 20, 1996
Applicant:
Inventors:
Anna M Budde, Livonia, MI (US);
James A Laugal, Union Lake, MI (US);
Walter H Ohrbom, Southfield, MI (US);
Marvin L Green, Brighton, MI (US);
Mark R Montagne, Southfield, MI (US);
Assignee:
BASF Corporation, Southfield, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
526270 ; 526273 ; 526281 ; 5263171 ; 5263285 ;
Abstract
A sterically-hindered monomer is used to make a polymer which in turn is useful in coating compositions. The resulting residue of the sterically-hindered monomer is present in the polymer, as well as in a cured coating (preferably an automotive coating) produced using a coating composition having the polymer therein. The presence of the residue of the sterically-hindered monomer imparts in the cured coating a resistance to environmental etching.