The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1999
Filed:
Sep. 25, 1997
Applicant:
Inventor:
Koichi Izumi, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 84 ; 378 43 ;
Abstract
A method of generating an X-ray microbeam of the present invention generates an X-ray microbeam having a restricted divergence angle and desirable planeness in regions other than the focus. With this method, it is possible to compensate for a change in the degree of asymmetry ascriable to a change in the wavelength of X-rays selected, and therefore to maintain the degree of asymmetry constant. In addition, the condensing conditions including the energy of X-rays and beam size each can be set independently of the others. A device for practicing the above method is also disclosed.