The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1999
Filed:
Jun. 25, 1996
Applicant:
Inventors:
Hiroshi Kurosawa, Matsudo, JP;
Kunitaka Ozawa, Utsunomiya, JP;
Noriyasu Hasegawa, Utsunomiya, JP;
Keiji Yoshimura, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 55 ; 355 67 ; 355 71 ;
Abstract
An exposure apparatus and device manufacturing method having structure and steps for projecting, for scan exposure of a substrate through an original, a plurality of light pulses from a pulse light source to the substrate through the original, changing an emitted light intensity of light pulses from the pulse light source during the scan exposure, and changing timing of light emission from the pulse light source during the scan exposure, whereby both the emitted light intensity and the timing of light pulses may be controlled during the scan exposure.