The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1999
Filed:
Apr. 07, 1997
Harukazu Miyamoto, Hachioji, JP;
Toshio Niihara, Sayama, JP;
Norio Ohta, Ibaraki-ken, JP;
Fumiyoshi Kirino, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi Maxell, Ltd., Osaka, JP;
Abstract
In a magneto-optical recording medium which comprises a transparent substrate, a first dielectric film, a magnetic film, a second dielectric film and a metal reflective film, formed successively one upon another, Kerr rotation angle can be increased without lowering the reflectivity by setting the thickness of the first dielectric film to 120-220% of a minimum film thickness among film thicknesses showing a minimum reflectivity and setting the thickness of the second dielectric film to 80-120% of a film thickness showing a maximum Kerr rotation angle and furthermore by making the refractive index of the first dielectric film lower than that of the second dielectric film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile