The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 1999
Filed:
Jun. 29, 1994
Applicant:
Inventors:
Assignee:
Patrick E. Crane, Tampa, FL (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; G02B / ;
U.S. Cl.
CPC ...
359385 ; 359368 ;
Abstract
Diffraction patterns in a focal region are governed by immersing the focal region in dielectric medium having an index of refraction higher than one. The pattern of the focal region is made small by causing the focal region to be immersed in a body having an index of refraction greater than 1. The resulting diffraction pattern sensed appropriately in the focal region is independent of traditional aperture limitations in resolving power. Microwave pictures are taken at the same resolution as optical pictures using the same aperture size when an appropriate dielectric immersion material is provided.