The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 1999

Filed:

Aug. 22, 1996
Applicant:
Inventors:

Krzysztof Matyjaszewski, Pittsburgh, PA (US);

Dorota Greszta, Pittsburgh, PA (US);

Assignee:

Carnegie-Mellon University, Pittsburgh, PA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526217 ; 546223 ; 564236 ; 564300 ;
Abstract

An improved process for free radical polymerization is produced making it possible to control the growth steps of a polymerization to produce homopolymers and copolymers, including block and graft copolymers. The process uses a long half-life radical initiators and compounds which have the structure of formula I ##STR1## wherein X is a group having at least one carbon atom and is such that the free radical X is capable of polymerizing the unsaturated monomer by free radical polymerization, and the radical functionality resides on the or one of the carbon atoms, R.sup.1, R.sup.2, R.sup.5 and R.sup.6 represent the same or different straight chain or branched substituted or unsubstituted alkyl groups of a chain length sufficient to provide steric hindrance and weakening of the O--X bond, and R.sup.3 and R.sup.4 represent the same or different, straight chain or branched, substituted alkyl groups or R.sup.3 CNCR.sup.4 may be part of a cyclic structure which may have fused with it another saturated or aromatic ring, the cyclic structure or aromatic ring being optionally substituted.


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