The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 1999
Filed:
Mar. 03, 1997
Hideyuki Hatanaka, Chiba, JP;
Keita Miyasato, Fukushima, JP;
Nitto Boseki Co., Ltd., Fukushima, JP;
Abstract
A method for forming a resin pattern which includes selectively polymerizing a photopolymerizable resin utilizing a light radiated from a photosensitive substance to form a desired resin pattern. A photosensitive substance layer is formed in a desired pattern on a substrate (or in a substrate when it is light permeable). The photosensitive substance absorbs an irradiation light and radiates a light of a longer wavelength than that of the irradiation light. A photopolymerizable resin layer formed on the substrate is not activated by the irradiation light but is activated by the light radiated from the photosensitive substance. The photopolymerizable resin layer is irradiated with an irradiation light capable of exciting the photosensitive substance and the photo-polymerizable resin is polymerized in the pattern of the photosensitive substance layer with the light radiated from the photosensitive substance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile