The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 1999
Filed:
Jan. 06, 1997
Nakamichi Yamasaki, Kochi, JP;
Tsuneaki Mochida, Yokohama, JP;
Akihiro Maeda, Kawasaki, JP;
Takeshi Fukuda, Kurobe, JP;
Tsuyoshi Morimura, Kurobe, JP;
Other;
YKK Corporation, Tokyo, JP;
Abstract
A continuous hydrothermal synthesis method which comprises pressurizing and heating a material slurry below a saturated vapor temperature or pressurizing a material slurry at normal temperature, pressurizing and heating an aqueous liquid above the saturated vapor temperature, atomizing and mixing the slurry and the aqueous liquid, effecting hydrothermal synthesis in a reaction section above the saturated vapor temperature, cooling the reaction product and taking out the product while retaining the pressurized state in the system by alternately opening and closing shut-off valves provided above and below a product discharging section or through a thin pipe provided in the product discharging section. The method is performed using an apparatus comprising heating-pressurizing sections respectively connected to a material slurry feeding section and an aqueous liquid feeding section, an atomizing-mixing section and a reaction section provided after these feeding sections, and a product discharging section.