The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 1999

Filed:

Jan. 12, 1998
Applicant:
Inventors:

Wataru Isokawa, Hino, JP;

Kenji Yamanouchi, Hino, JP;

Hiroshi Furuuchi, Hino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
396626 ; 396636 ; 396641 ;
Abstract

A light-sensitive material processing apparatus comprises a circulating path through which processing solution in a processing tank is circulated; a pump for circulating the processing solution through the circulating path; and an oxidation promoting section provided to at least one of a part of the processing tank and a part of the circulating path, the oxidation promoting section having a depth shallower than that of the processing tank and a upper portion open to atmosphere, wherein a flow speed of the processing solution at the oxidation promoting section is not slower than 1.times.10.sup.3 mm/min.


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