The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 1999
Filed:
May. 14, 1997
Applicant:
Inventor:
Nagao Ogiwara, Ashigarakami-gun, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03D / ; G03G / ;
U.S. Cl.
CPC ...
396575 ; 396612 ; 2503171 ; 250319 ;
Abstract
A photosensitive material processing apparatus includes a heating drum, against which a processing sheet is pressed. A film is sandwiched between the processing sheet and the heating drum and is transported thereby while being heated, so that the film undergoes heat development. Accordingly, through a simple development process, images can be formed on the film. In addition, the maintainability of the photosensitive material processing apparatus can be improved.
Ogiwara, Nagao. (1999). Photosensitive material processing apparatus (U.S. Patent No. 5907735). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5907735
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile