The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 1999
Filed:
Nov. 21, 1997
Toyoyuki Hara, Yamanashi-ken, JP;
Kazuhito Nakagomi, Yamanashi-ken, JP;
Nisca Corporation, Yamanashi-ken, JP;
Abstract
In an exposing aperture device having a pair of exposing diaphragms which are moved in opposite directions while being guided by guide members formed on a base plate, the guide members are each formed of a vertical rising part with a first contact protrusion coming into point contact with the diaphragms and a horizontal ledge part with a second contact protrusion being in point contact with the diaphragms. By projecting the first and second contact protrusions more than burrs which are inevitably left on the rising part and ledge part as the result of forming the base plate by a punching process or a resin molding process, the exposing diaphragms can be moved smoothly and stably to control exposure with a high accuracy without being affected by the burrs.