The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 1999

Filed:

Jul. 16, 1997
Applicant:
Inventors:

Wayne F Niskala, Rochester, NY (US);

Richard A Simon, Rochester, NY (US);

Joseph A Manico, Rochester, NY (US);

W Patrick Fricke, Fairport, NY (US);

Kristine A Moon, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A42C / ;
U.S. Cl.
CPC ...
2206 ; 2173 ; 347-3 ;
Abstract

A method of making a mask representing a photographic subject includes the steps of: simultaneously capturing a front and two side face views of the subject using a single camera and a pair of mirrors, one mirror on each side of the subject's head; forming a digital image of the captured front and side views; digitally processing the digital image by mirroring the two side views and blending the two side views with the front view to form a blended image; and transferring the blended image to a head sock.


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Quick Actions:

Niskala, Wayne. (1999). Process and apparatus for making photorealistic masks and masks made (U.S. Patent No. 5906005). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5906005

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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