The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1999
Filed:
Apr. 23, 1997
Sang Man Bae, Kyoungki-do, KR;
Hyundai Electronics Industries Co., Ltd., Kyoungki-do, KR;
Abstract
A method for detecting microscopic differences in the thickness of a photoresist film coated on a wafer through naked eyes, which is capable of accurately controlling the critical dimension of the photoresist film patterns even in devices of 256 M DRAM or more and allows the yield to be analyzed with accuracy, comprising the steps of: subjecting the photoresist film to thermal treatment at a low temperature, to make some low molecular weight compounds or solvent molecules to remain within the photoresist film; forming a special material layer over the photoresist film within a certain thickness; and executing high-temperature thermal treatment, to gush up the remaining low-molecular weight compounds or solvent molecules from the photoresist film through relative thin parts of the special material layer.