The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1999
Filed:
Mar. 28, 1996
Applicant:
Inventor:
Larry Y Wang, San Jose, CA (US);
Assignee:
Advanced Micro Devices, Inc, Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ;
U.S. Cl.
CPC ...
438444 ;
Abstract
A method of rounding corners of isolating trenches formed in a substrate with a planar surface includes a first step of forming a masking material on the planar surface. Edges of the masking material are offset from the corners of the isolating trenches. The second method step includes growing an oxide on an exposed portion of the substrate under high temperature. The oxidation under high temperature causes the corners of the isolating trenches to become rounded.