The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1999
Filed:
Jan. 24, 1997
James B Williamson, Sunnyvale, CA (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
An imaging system includes a compound elliptical concentrator having an illumination source at an entry aperture and having an exit aperture directed to project light onto the surface of an object. The compound elliptical concentrator includes first and second reflective surfaces that are arcs of different ellipses. The ellipse that defines the arc of the first reflective surface has one focus that is proximate to an entry end of the second reflective surface. The ellipse that defines the arc of the second reflective surface has a focus that is proximate to the entry end of the first reflective surface. The other foci of the ellipses are at or beyond the exit aperture of the compound elliptical concentrator and are preferably symmetrically aligned with respect to the surface to be imaged. The reflective surfaces are on the opposite sides of a plane of symmetry and are configured such that multiple reflections of extreme rays from the illumination source are deterred. In some embodiments, the light returned from the surface of the object is coupled to a detector along a path that re-enters the compound elliptical concentrator and then passes through an opening in one of the reflective surfaces. The detector may be an electrical sensor or the optical elements of a conventional photocopier.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile