The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1999
Filed:
Oct. 07, 1997
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A spectroscopic analyzing method and apparatus for a wafer surface and gas phase elements in a reaction chamber. A beam of radiant energy is introduced from a light incident apparatus to the reaction chamber through a window on a wall of the reaction chamber at a predetermined, but variable, angle of incidence. The angle of incidence is set by adjusting optical elements in the light incident apparatus and an angle of the window. At one angle of incidence, the beam of radiant energy is caused to interact with gas-phase elements in the reaction chamber for spectroscopic analysis. At another angle of incidence, the beam of radiant energy is caused to interact with the wafer surface for spectroscopic analysis.