The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1999
Filed:
Jun. 01, 1992
Atsumi Yamaguchi, Hyogo-ken, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
Methods for developing a positive photoresist comprise providing a positive photoresist and developing the positive photoresist with a developer comprising a quaternary ammonium hydroxide and a quaternary ammonium halogenide. The positive photoresist has an unexposed portion dissolution rate with a 2.38 weight % aqueous solution of tetramethyl ammonium hydroxide of about 1 .ANG./sec or less. The quaternary ammonium halogenide is of the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 are selected from the group consisting of ethyl, methyl, hydroxy methyl, hydroxy ethyl and hydrogen, and X is a halogen atom.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile