The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1999
Filed:
Sep. 29, 1995
Giovanni Carrea, Colorado Springs, CO (US);
Brian D Warrick, Colorado Springs, CO (US);
D.D.I. Limited, British West Indies, US;
Abstract
A two-stage process method for removal of impurities such carbon monoxide, carbon dioxide, oxygen, water, hydrogen, and methane from inert gases at ambient temperature (0.degree.-60.degree. C.). In the first stage the inert gas is contacted with a nickel catalyst, and in the second stage the inert gas is passed over a getter alloy. Purified gas exiting the second stage of the purifier contains less than one part per billion (ppb) levels of the impurities. The nickel catalyst and getter alloy are initially activated at elevated temperature. The catalyst and getter may be reactivated by heating and purging, and hydrogen previously removed from impure gas can be used in the reactivation process.