The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1999
Filed:
Nov. 22, 1996
Sang Man Bae, Ichon-shi, KR;
Abstract
A method for forming accurate micro patterns having a micro dimension smaller than the resolution of a stepper used on a semiconductor substrate, thereby achieving an improvement in the integration degree of the semiconductor device which is ultimately produced. The method includes the steps of coating an under photoresist film over an etchable layer, laminating first and second intermediate films over the under photoresist film, forming patterns of the second intermediate film by use of a first light exposure mask having light shield patterns corresponding to those selected in an interlaced manner from micro patterns to be formed, namely, every second one of adjacent micro patterns, forming patterns of the first intermediate film by use of a second light exposure mask having light shield patterns corresponding to the remaining micro patterns, and patterning the under photoresist film while using the first and second-intermediate film patterns as a mask, thereby obtaining under photoresist film patterns having micro space and line widths.