The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 1999

Filed:

Jul. 28, 1997
Applicant:
Inventors:

Carl A Chiulli, Randolph, MA (US);

Yalan Mao, Lexington, MA (US);

William T Plummer, Concord, MA (US);

Assignee:

Polaroid Corporation, Cambridge, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J / ; G01D / ;
U.S. Cl.
CPC ...
347256 ; 347260 ; 347241 ; 430502 ;
Abstract

Apparatus and methods for exposing multilayered thermal imaging media to eliminate 'cloud' or 'woodgrain' artifacts by proper optimization of the exposing radiation angle of incidence. The exposure angle of incidence is large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency.


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