The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1999
Filed:
Aug. 29, 1996
Applicant:
Inventor:
Mikio Mukai, Kanagawa, JP;
Assignee:
Sony Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438700 ; 438702 ; 438947 ; 438942 ; 430314 ; 430316 ;
Abstract
A base is etched using as mask a first masking layer which has been patterned, softened and deformed. Then, the first masking layer is eroded, a second masking layer is selfaligningly formed only on bare portions of the base, and the base is again etched using as mask the second masking layer. Within a pitch of the first masking layer, the base can thus be etched in two regions which are separated from each other. These treatments can also be conducted in two directions.