The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 1999
Filed:
Mar. 27, 1997
Thomas M Holladay, Webster, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A method of reducing visible image artifacts that utilizes variable phase parameters (i.e., the standard x, y start position in halftone cells) during halftoning processes to match the phases of halftone cells, and further utilizes a brick approach to halftoning. The position in a halftone dot structure is correlated to the phase of sine waves for subsequent dots to be used in a halftoning process. Utilizing a selected x, y start position in halftone cells to match phase parameters of said halftone cells according to said position of said halftone dot and said subsequent dots. Switching from one dot to another dot on the same new starting position in the second dot will improve the probability that the thresholds and the slopes of the halftone dots are matched at the boundary between the two different dots.