The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 1999
Filed:
Aug. 21, 1996
Robert R Wampler, Augusta, KS (US);
Lisa D Riley, Wichita, KS (US);
The Boeing Company, Seattle, WA (US);
Abstract
A probing system that checks a pattern formed by a plurality of features of an object. The system includes an input device that receives an ideal position and an ideal set of dimensions of each of the plurality of features, as well as an acceptable tolerance for the plurality of features. The input device generates a first signal. A probe device is electrically connected to the input device to receive the first signal, and in response, directs a probe to a location of samples. The probe device outputs a second signal indicative of a measured location of each of the samples. A processor is electrically connected to the probe device and the input device, and performs the operations of receiving and storing in memory the first signal indicative of the ideal position and tolerance of each of the plurality of features, receiving and storing in the memory the second signal indicative of the measured location of each of the samples from the probe device, and calculating a measured position of each of the plurality of features based on the measured location of each of the samples. The processor also offsets the stored ideal position of each of the plurality of features by a predetermined value of variance to an adjusted ideal position of each of the plurality of features, and determines whether the measured position of each of the plurality of features falls within the acceptable tolerance of the respective adjusted position of each of the plurality of features.