The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 1999
Filed:
Mar. 28, 1996
Applicant:
Inventors:
Daoyang Huang, Hsinchu, TW;
Chao-Tsang Wei, Taipei, TW;
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ; B05D / ;
U.S. Cl.
CPC ...
427579 ; 4272481 ; 427353 ; 427354 ;
Abstract
A fog-resistant microporous transparent film and the method of manufacturing the same are described. The fog-resistant film is made of SiOH which can absorb water molecules by both of a polar --Si--OH functional group and microporosity, and is hence provided with excellent and stable wettability. The SiOH film is coated on a PMMA or PC substrate by ion-assisted plasma-enhanced e-beam or thermal evaporation.