The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1999
Filed:
Sep. 24, 1996
Maurice Peter Bianchi, Palos Verdes Estates, CA (US);
James August Roth, Redondo Beach, CA (US);
Mark Arthur Kruer, Redondo Beach, CA (US);
TRW Inc., Redondo Beach, CA (US);
Abstract
A high precision replication system creates a nearly atomic level replica. The basic building block of the replication system is a substrate with a smooth replication surface which is to be replicated, and a graded transition layer applied to the replication surface. The graded transition layer comprises a binding material that adheres strongly to the replication surface and a release material that adheres to the replication surface with substantially less force than does the binding material. The portion of the transition layer closest to the substrate comprises predominantly the binding material, and the portion of the transition layer farthest from the substrate comprises predominantly the release material. A separation layer is applied to the transition layer, followed by a coating. The coating provides a backing to the separation layer, acting as structural support to the separation layer. The coating with the separation layer adhered thereto is then separated from the transition layer, thereby providing a high fidelity replica.