The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 1999

Filed:

Jul. 02, 1997
Applicant:
Inventors:

Tony D Beckett, Dayton, OH (US);

Larry D Holden, Bellbrook, OH (US);

David R Seitz, Vandalia, OH (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41C / ;
U.S. Cl.
CPC ...
358299 ;
Abstract

An engraving system and method for engraving a pattern, such as an intermeshing pattern, using a plurality of engraving devices is disclosed. The engraving system and method sequences and engraves the plurality of engraving devices such that when the areas engraved by those devices meet, they provide a continuous engraved pattern. The system and method also includes an imaging system and method for imaging the engraved areas associated with the engraving heads so that the heads or signals driving the heads may be adjusted to further facilitate providing engraved areas which appear as if they had been engraved by a single engraving head when, for example, an engraved area of one head meets an engraved area of other head. Also disclosed is a method and system for sequencing and transmitting image data associated with an image to be engraved in order to accommodate any cylindrical offset or an angular displacement between, for example, two engraving heads that are positioned in a generally opposed relationship.


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