The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 1999

Filed:

Dec. 22, 1997
Applicant:
Inventors:

Jin-Yuh Lu, Taipei, TW;

David Nan-Chou Liu, Chutung, TW;

Jammy Chin-Ming Huang, Taipei, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ; H01J / ; H01J / ;
U.S. Cl.
CPC ...
313496 ; 313495 ; 313238 ; 313292 ; 313309 ; 313336 ; 313351 ; 220445 ;
Abstract

This invention provides a method of fabrication and structure for spacers between the anode substrate and the cathode substrate of a field emission display. The spacers have a high aspect ratio and which will be invisible to the human eye in the display image. An adhesive dielectric paste of glass frit in a binder is formed in cylindrical holes in a photoresist layer. Glass spacer spheres are placed on each column of dielectric paste. When fired the glass frit coalesces into a solid glass rod and bonds the glass spacer sphere to one end of the solid glass rod and the anode substrate to the other end of the solid glass rod. The firing also burns away the photoresist layer. The dark area in the image due to the spacers is less than 50 micrometers which will be invisible to the human eye.


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