The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 1999
Filed:
Aug. 16, 1996
Applicant:
Inventors:
Manoocher Birang, Los Gatos, CA (US);
Allan Gleason, San Jose, CA (US);
William L Guthrie, Saratoga, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24D / ;
U.S. Cl.
CPC ...
451526 ; 451283 ; 451285 ; 451287 ;
Abstract
The polishing pad for a chemical mechanical polishing apparatus and a method of making the same. The polishing pad has a covering lawyer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.
Published as:
EP0824995A1; JPH1083977A; KR19980018668A; KR19980018667A; TW339460B; SG54539A1; US5893796A; US6045439A; US6280290B1; US2001036805A1; KR100334203B1; JP3327817B2; US2003190867A1; SG111000A1; US6910944B2; US2006014476A1; US7011565B2; US7118450B2; US2007021037A1; US7255629B2;