The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 1999

Filed:

Apr. 24, 1997
Applicant:
Inventor:

David L Losee, Fairport, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438 75 ;
Abstract

A method and apparatus of manufacturing an array of closely spaced electrodes wherein a semiconductor surface having a plurality cells that are capable of storing charge is fabricated such that there are a plurality of closely spaced electrodes associated with the cells and placing insulation regions between the closely spaced electrodes. The insulating regions are preferably made out of silicon dioxide and the material to form the electrodes is selected as one that is not oxidizable to silicon dioxide. The preferred embodiment uses an electrode material indium tin oxide. A barrier region is provided to assist charge transfer in the preferred embodiment the barrier region is preferably edge aligned to one of the electrodes.


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