The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1999
Filed:
Oct. 15, 1997
Applicant:
Inventors:
Nobuhito Fukui, Osaka, JP;
Yuko Yako, Osaka, JP;
Hiroshi Takagaki, Osaka, JP;
Kenji Takahashi, Osaka, JP;
Assignee:
Sumitomo Chemical Company, Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430170 ; 4302701 ; 430905 ;
Abstract
A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity, resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises
Fukui, Nobuhito. (1999). Positive resist composition (U.S. Patent No. 5891601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5891601
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile