The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 1999
Filed:
Dec. 22, 1997
Hideaki Nomura, Minami-ashigara, JP;
Toshio Kurokawa, Minami-ashigara, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A development processing apparatus includes: a plurality of stock tanks which stores a plurality of types of processing solutions; a small-volume single processing tank including an entrance/exit port for a film which enables the entering/exiting of the film, the processing tank accommodating the film via the entrance/exit port for a film and developing the film in the plurality of types of processing solutions; processing solution supply which supplies the plurality of types of processing solutions from the plurality of stock tanks to the processing tank in a predetermined order; a sensor which measures the temperature of the processing solution within the processing tank; a heater which is disposed at the stock tanks or the processing solution supply and heats the processing solution; and control which is connected to the processing solution supply and the heater and controls the processing solution supply such that the last processing solution supplied to the processing tank is filled within the processing tank even after the film is removed from the processing tank, and the control controlling the heater such that the temperature of the last processing solution is set to a predetermined temperature and that the processing tank is lagged by the last processing solution heated by the heater. Therefore, because the processing tank is lagged by the heated last processing solution upon insertion of the film, the development processing can be effected rapidly at optimal temperature.