The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 1999
Filed:
Jul. 08, 1997
Applicant:
Inventors:
Beth McCulloch, Clarendon Hills, IL (US);
Timothy A Brandvold, Buffalo Grove, IL (US);
Peter K Nickl, Des Plaines, IL (US);
Jennifer S Holmgren, Bloomingdale, IL (US);
Joseph J Alcaraz, Des Plaines, IL (US);
Assignee:
Uop LLC, Des Plaines, IL (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ; B01J / ; C01B / ; B32B / ;
U.S. Cl.
CPC ...
502407 ; 502411 ; 502159 ; 502169 ; 502172 ; 502224 ; 502232 ; 502233 ; 502243 ; 502507 ; 423335 ; 428403 ; 428407 ;
Abstract
Chiral stationary phases perform well when the underlying support for the chiral organic material is coated onto a silica pore widened by a hydrothermal treatment. The resulting silica is amorphous with a unimodal distribution of large pores. A variety of chiral stationary phases perform well and are distinguished, inter alia, by the treatment, if any, prior to coating the chiral organic material.