The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 1999

Filed:

Oct. 15, 1996
Applicant:
Inventor:

Stephen C Payne, Louisville, KY (US);

Assignee:

Payne-Sparkman Manufacturing, Inc., New Albany, IN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V / ;
U.S. Cl.
CPC ...
362321 ; 362263 ; 362294 ;
Abstract

Disclosed is a shutter system for selectively blocking the path of light of a high intensity discharge lamp. The shutter system comprises a high intensity discharge lamp, a high intensity discharge light housing into which the lamp is secured and a shutter and light absorption system secured to the light housing comprising a light absorbing shutter screen, a screen moving system for moving the screen in front of the lamp to block selectively the path of light and for withdrawing the screen from the path of light and a support system for the screen moving system, wherein said screen when retracted will not significantly interfere with the path of light of the system and when fully extended will substantially block the path of light of the high intensity discharge lamp.


Find Patent Forward Citations

Loading…