The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Apr. 15, 1993
Robert Aprahamian, Hermosa Beach, CA (US);
George L Clark, Manhattan Beach, CA (US);
Lee O Heflinger, Torrance, CA (US);
Jesper Munch, BelAir, AU;
Ralph Frederick Wuerker, Westlake Village, CA (US);
TRW Inc., Redondo Beach, CA (US);
Abstract
A technique for correcting wavefront aberrations introduced by large primary optical elements in portions of the electromagnetic spectrum. The aberrations of the primary element are first transferred to a beacon beam and this aberrated beam is interfered with a reference beam in a holographic medium. These beams are then turned off and a beam from a distant object, containing the same aberrations, is allowed to diffract from the hologram. The diffracted beam from the hologram contains the image of the distant object with aberrations removed. Use of this technique permits the construction of large optical elements inexpensively, since surface tolerances of the elements can be substantially relaxed.