The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Oct. 28, 1997
Applicant:
Inventors:
Yuji Kasai, Tsukuba, JP;
Shigeki Sakai, Tsukuba, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01J / ; G01N / ;
U.S. Cl.
CPC ...
356 72 ; 356311 ;
Abstract
A method of measuring a beam flux rate in a film growth apparatus which includes supplying a hollow cathode lamp with a current that alternates between two current values and does not include a zero current, introducing intensity-modulated spectral light emitted by the hollow cathode lamp into a vacuum chamber of a film growth apparatus, absorbing the light by a beam of atoms projected at a substrate surface, and detecting components synchronized with the modulation of the spectral light obtained.
Kasai, Yuji. (1999). Method of measuring atomic beam flux rate in film growth apparatus (U.S. Patent No. 5886778). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5886778
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