The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Mar. 17, 1997
Akira Tanaka, Kawasaki, JP;
Masami Koshiyama, Kawasaki, JP;
Kei Sakamoto, Kawasaki, JP;
Yasuhiro Yoneda, Kawasaki, JP;
Kishio Yokouchi, Kawasaki, JP;
Daisuke Mizutani, Kawasaki, JP;
Yoshikatsu Ishizuki, Kawasaki, JP;
Nippon Zeon Co., Ltd., Tokyo, JP;
Fujitsu Limited, Kanagawa, JP;
Abstract
Disclosed herein is a pattern forming process comprising the steps of coating a substrate with a photosensitive resin composition comprising a polyamic compound having, at each terminal thereof, an actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group, a photopolymerization initiator, and a solvent to form a film; subjecting the film to pattering exposure; and then developing the thus-exposed film with an alkaline developer or alkaline aqueous solution.