The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Nov. 02, 1995
Mark S Trimmer, Monrovia, CA (US);
Ying Wang, Diamond Bar, CA (US);
Matthew L Marrocco III, Santa Ana, CA (US);
Virgil J Lee, La Verne, CA (US);
Maxdem Incorporated, San Dimas, CA (US);
Abstract
A new class of polyarylene co-polymers include repeating units comprising one or more arylene units having the general formula (--Ar--/--Y--).sub.n, where Y is a divalent group chosen from nil, --Z--, --Z--Ph--, and --Ph--Z--Ph--, where Z is a divalent group chosen from the group consisting of --O--, --S--, --NR--, --O(CO)--, --O(CO.sub.2)--,--(CO)NH(CO)--, --NR(CO)--, phthalimide, pyromellitimide, --CO--, --SO--, --SO.sub.2 --, --P(O)R--, --CH.sub.2 --, --CF.sub.2 --, and --CRR'--; Ph is phenylene (ortho, meta or para); and n is greater than 4. The co-polymers are useful as molding resins, and composite matrix resins, and where Ar is heteroarylene as ion exchange resins.