The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Jul. 08, 1997
Applicant:
Inventor:
I-fan Wang, San Diego, CA (US);
Assignee:
Memtec America Corporation, South Windsor, AU;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ; B01D / ; B01D / ;
U.S. Cl.
CPC ...
521 64 ; 21050041 ; 210-1 ; 264 41 ; 521180 ; 521189 ;
Abstract
Highly asymmetric polyethersulfone membranes prepared from a stable, clear, homogeneous solution or stable colloidal dispersion of polyethersulfone are described. The membranes have a porous skin possessing a high density of skin pores with an average diameter of from about 0.001 micron to about 20 microns. In addition, the membrane has a porous support with an asymmetric region of gradually increasing pore diameters so that the opposite face of the membrane has an average pore diameter that is from about 50 to about 10,000 times the diameter of the skin pores.