The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Jul. 14, 1997
Applicant:
Inventors:
Seung-joon Yoo, Suwon, KR;
Ik-chul Lim, Suwon, KR;
Chang-wook Kim, Suwon, KR;
Ki-wook Kang, Seongnam, KR;
Assignee:
Samsung Display Devices Co., Ltd., Kyungki-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430196 ; 430 28 ; 430167 ; 430197 ;
Abstract
A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products.