The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Jan. 10, 1997
Applicant:
Inventors:
Robert T Rasmussen, Boise, ID (US);
Surjit S Chadha, Meridian, ID (US);
David A Cathey, Boise, ID (US);
Assignee:
Micron Display Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K / ; C09K / ; C09K / ;
U.S. Cl.
CPC ...
252 792 ; 252 793 ; 252 794 ;
Abstract
The present invention is directed to a novel etching process for a semiconductor material which inhibits corrosion of metal comprised of pretreating the material, preferably with a surfactant, and then exposing the material to a mixture comprising salt, a buffered oxide etch, and optionally a surfactant.
Rasmussen, Robert. (1999). Silicon dioxide etch process which protects metal (U.S. Patent No. 5885477). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5885477
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile