The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1999
Filed:
Jun. 04, 1996
Hideto Takahashi, Kanagawa-ken, JP;
Soichiro Sakata, Kanagawa-ken, JP;
Katsumi Sato, Kanagawa-ken, JP;
Takasago Thermal Engineering Co., Ltd., Tokyo, JP;
Abstract
Apparatus and a method for evaluating the contamination over the surface of a substrate for use in manufacturing semiconductor devices, liquid crystal devices and so on, said contamination being caused by contaminants, for instance airborne organic substances or the equivalent in the clean room atmosphere. For evaluation, there is measured with passage of time in the atmosphere having a substantially constant relative humidity the surface resistivity (R) of the substrate 104 by bringing electrodes 106 into close contact with an insulating film as formed on said substrate surface, or a contact angle (.alpha.) of a liquid-drop 207 dropped on the substrate 206. From this measurement, the degree of said contamination is judged by comparing the value of the surface resistivity or contact angle as measured immediately after rinsing the substrate, with the values of the same as measured after exposing the substrate to the objective atmosphere to be evaluated.