The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1999
Filed:
Apr. 01, 1996
Chia-Fu Chen, Hsinshu City, TW;
Kazuhito Nishimura, Osaka, JP;
Ensei Ko, Oiso-machi, Naka-gun, Kanagawa-ken, JP;
Hiroshi Ishizuka, Tokyo, JP;
Satoru Hosomi, Kanagawa-ken, JP;
Ishizuka Research Institute Ltd., Kanagawa-ken, JP;
Other;
Osaka Diamond Industrial Co., Ltd, Sakai, JP;
Abstract
A method is provided for efficiently producing an entirely quality-controlled CVD diamond. A CVD process is interrupted at an early stage and the deposit is taken out of the reaction chamber, before a significant mass is accumulated, and is inspected by means of cathodoluminescence. The spectrum are compared with a given reference in terms of peak position, half width and 20%-value width in coordination. The observed deviation allows to determine whether to maintain or alter the settings. A diamond substance of acceptable quality which is properly specified in terms of the CL parameters is also provided.