The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1999
Filed:
Oct. 08, 1997
Applicant:
Inventors:
Hiroko Iwasaki, Tokyo, JP;
Yoshiyuki Kageyama, Yokohama, JP;
Makoto Harigaya, Hiratsuka, JP;
Masaetsu Takahashi, Yokohama, JP;
Hiroshi Deguchi, Yokohama, JP;
Katsuyuki Yamada, Mishima, JP;
Yoshitaka Hayashi, Yokohama, JP;
Yukio Ide, Mishima, JP;
Assignee:
Ricoh Company, Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; B41M / ;
U.S. Cl.
CPC ...
20429813 ; 148430 ; 148513 ; 148514 ; 75228 ; 75247 ; 419 33 ;
Abstract
A sputtering target, for forming a recording layer of an optical recording medium in which information is written and erased through a transition between two phases by utilizing electromagnetic wave energy, consists of a heat-treated and sintered composition represented by the formula:
Iwasaki, Hiroko. (1999). Heat treated and sintered sputtering target (U.S. Patent No. 5882493). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5882493
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile