The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1999
Filed:
Sep. 09, 1996
Richard A Sauer, Hinsdale, IL (US);
Jean-Luc Hubert, Clarendon Hills, IL (US);
Robert W Connors, Western Springs, IL (US);
Air Liquide America Corporation, Houston, TX (US);
Abstract
The cleaning process according to the present invention includes three main steps including supercritical extraction of soluble contaminants with a solvent composition, subcritical removal of particulate material with agitation, and solvent recovery and recycle. The supercritical extraction of soluble contaminants is performed by pumping a solvent composition into a cleaning vessel containing articles to be cleaned and pressurizing and heating the fluid in the vessel to a supercritical state. Then the subcritical phase is begun to remove particulate material from the articles by reducing the pressure and temperature of the solvent composition in the cleaning vessel to a subcritical state and reforming the liquid/gas interface. Agitation of the articles in the cleaning vessel is provided by recirculation of the solvent composition or by motion of a mechanical device within the cleaning vessel. Due to a density difference between gas and liquid in the subcritical phase, the degree of agitation and resultant particulate removal is maximized. The solvent composition recovery step preferably includes further depressurization of the fluid to separate and remove soluble and insoluble contaminants from the fluid, allowing this solvent composition to be reused. The system may be operated with any gas with suitable solvent properties such as carbon dioxide, carbon dioxide based mixtures, or other known solvents.