The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 1999

Filed:

Oct. 25, 1996
Applicant:
Inventor:

Horng-Jong Wang, Taichung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V / ;
U.S. Cl.
CPC ...
250548 ; 2505593 ; 2505594 ; 2502221 ; 156567 ; 414757 ; 414936 ; 356400 ;
Abstract

The present invention is an orientation flat aligner for preventing the angle deviation of the flat edge of the wafer. This invention applies two new designs to the aligner: (1) The two parallel rollers with different radius instead of two parallel rollers the same radii prevent the problem of the angle deviation to line up the flat edge of the wafer. (2) placing the photosensor on the orientation flat aligner instead of on the sensor bracket avoids the detection error because of the photosensor position relate to the orientation flat aligner position and saves time on checking whether the flat edge of the wafer line up or not.


Find Patent Forward Citations

Wang, Horng-Jong. (1999). Wafer aligner apparatus using different diameter rollers (U.S. Patent No. 5880479). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5880479

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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