The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1999
Filed:
Jul. 15, 1998
Lau S Yang, Wilimington, DE (US);
Gangfeng Cai, Westh Chester, PA (US);
Diandre Armstead, Philadelphia, PA (US);
Arco Chemical Technology, L.P., Greenville, DE (US);
Abstract
A process for making polyetherester resins is disclosed. A glycol ester of an aromatic diacid such as terephthalic acid is reacted with a polyether and a source of a dicarboxylic acid such as maleic anhydride to produce a polyetherester resin, wherein the aromatic diester content may be conveniently adjusted as desired. The process permits the preparation of unsaturated polyetherester resins with relatively high levels of terephthalate repeating units while avoiding the difficulties associated with the direct use of terephthalic acid in previously known procedures. Such unsaturated polyetheresters are useful for making thermoset resins with excellent mechanical and physical properties. New glycol esters based on 2-methyl-1,3-propanediol, and polyester resins and thermosets made from the glycol esters, are also disclosed.