The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1999
Filed:
Aug. 06, 1997
Teijin Limited, Osaka, JP;
Abstract
A photoresist layer supporting polyester film which is a biaxially oriented film formed from a polyester containing 0.01 to 0.1% by weight of porous silica particles that are agglomerates of primary particles having an average particle diameter of 0.01 to 0.1 .mu.m and have an average particle diameter of 0.1 to 5 .mu.m and a pore volume of 0.5 to 2.0 ml/g, the number of the porous silica coarse particles having a major diameter of not smaller than 50 .mu.m being 10 or less per m.sup.2 ; and a photoresist film laminate comprising the above polyester film and a photoresist layer and a protective film, the photoresist layer and the protective film being laminated on one surface of the photoresist layer supporting polyester film. The above photoresist layer supporting polyester film is excellent in transparency and handling properties (slipperiness), and the above photoresist film laminate has excellent resolution and is almost free from circuit defect.