The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1999
Filed:
Jun. 20, 1997
Woo Yung Jung, Kyoungido, KR;
Tae Gook Lee, Kyoungido, KR;
Hyundai Electronics Industries Co., Ltd., Kyoungkido, KR;
Abstract
A half-tone phase shift mask capable of preventing light from being transmitted in undesired areas, and thus capable of obtaining desired fine patterns. The present invention is to provide a photomask for simultaneously forming photoresist patterns on a first area in which fine patterns are to be formed and on a second area in which relatively large photoresist patterns are to be formed in a semiconductor device. The photomask comprises a transparent substrate, half-tone phase shift patterns disposed on the first area of the transparent substrate and light screen patterns disposed on the second area of the transparent substrate.