The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1999
Filed:
Jul. 10, 1996
Hiroshi Matsumoto, Odawara, JP;
Hiroshi Yashiki, Odawara, JP;
Yoichi Inomata, Odawara, JP;
Tatsuya Yoneda, Kodaira, JP;
Kazuhiko Tsutsumi, Odawara, JP;
Noriyuki Shige, Odawara, JP;
Tokuho Takagaki, Hiratsuka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
To provide a magnetic disk excellent in floating and sliding characteristics in a low floating area. A magnetic disk having a feature that variations in the height of the projections on each surface of protective films in floating ensured areas on both sides of the magnetic disk are .+-.15%, and a magnetic disk device on which the magnetic disk is mounted. A surface processing apparatus for a magnetic disk, including: a first electrode for fixing the magnetic disk, the first electrode having an inside diameter larger than the inside diameter of the non-magnetic substrate; an electrically grounded shield for shielding the first electrode; a second electrode, disposed in parallel to the surface of the magnetic disk, for generating plasma against the surface of the magnetic disk; and a plasma control member, disposed at a position separated from the outer edge of the magnetic disk by a specified distance, for controlling plasma generated against the surface of the magnetic disk; wherein a power is applied between the first and second electrodes for plasma-etching the surface of the magnetic disk.