The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Sep. 12, 1996
Applicant:
Inventors:
Kumar Shiralagi, Chandler, AZ (US);
Raymond K Tsui, Phoenix, AZ (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438492 ; 438483 ; 438504 ; 438735 ; 438767 ;
Abstract
A method of removing an oxide mask during fabrication of semiconductor devices which includes providing a providing a III-V compound semiconductor substrate having a surface, the surface having a growth area and a masked area masked by an oxide film formed on the surface thereof. The oxide film is removed with a Trisdimethylamino group V compound.
Shiralagi, Kumar. (1999). Masking methods during semiconductor device fabrication (U.S. Patent No. 5877071). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5877071
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile